Influence of ion species ratio on grid-enhanced plasma source ion implantation
Wang Jiu-Li (王久丽)a, Zhang Gu-Ling (张谷令)a, Liu Yuan-Fu (刘元富)a, Wang You-Nian (王友年)b, Liu Chi-Zi (刘赤子)a, Yang Si-Ze (杨思泽)ab
a Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China; b State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116023, China
Abstract Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N$_2^+$ and atomic ions N$^+$ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N$_2^+$ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N$^+$ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.
Received: 23 May 2003
Revised: 02 June 2003
Accepted manuscript online:
Fund: Project supported by the National High Technology Development Program of China (Grant No 2002A331020), the National Natural Science Foundation of China (Grant Nos 50071068 and 10275088), the Science and Technology Program of Beijing Municipal Science and
Cite this article:
Wang Jiu-Li (王久丽), Zhang Gu-Ling (张谷令), Liu Yuan-Fu (刘元富), Wang You-Nian (王友年), Liu Chi-Zi (刘赤子), Yang Si-Ze (杨思泽) Influence of ion species ratio on grid-enhanced plasma source ion implantation 2004 Chinese Physics 13 65
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