Fudan-T.D. Lee Physics Laboratory, Department of Physics, Fudan University, Shanghai 200433, China; State Key Laboratory of Applied Surface Physics, Fudan University, Shanghai 200433, China
Abstract A theoretical model for describing H2 dissociative chemisorption on Cu surfaces is proposed. The sticking probability S is calculated as a function of vibrational state, average kinetic energy and incident angle of hydrogen molecular beam. Within the theoretical frame of this model, the different contributions to S from H2($\nu$ = 0) and H2($\nu$ = 1) can be clearly distinguished. The calculated results indicate that vibrational energy significantly promotes the chemisorption of H2 on Cu surfaces in the region of low translational energy. The equations derived can be used to analyze the experimental data for both pure and seeded molecular beams.
Received: 03 January 1995
Accepted manuscript online:
(Surface and interface chemistry; heterogeneous catalysis at surfaces)
Fund: Project supported by the National Natural Science Foundation of China.
Cite this article:
XIE JIAN-JUN (谢建军), JIANG PING (蒋平), ZHANG KAI-MING (张开明) A THEORETICAL MODEL FOR H2 DISSOCIATIVE ADSORPTION ON Cu SURFACES 1995 Acta Physica Sinica (Overseas Edition) 4 691
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