| CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
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Improvement of the high-κ/Ge interface thermal stability using an in-situ ozone treatment characterized by conductive atomic force microscopy |
| Ji-Bin Fan(樊继斌)1, Xiao-Jiao Cheng(程晓姣)1, Hong-Xia Liu(刘红侠)2, Shu-Long Wang(王树龙)2, Li Duan(段理)1 |
1 School of Materials Science and Engineering, Chang'an University, Xi'an 710061, China;
2 School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China |
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Abstract In this work, an in-situ ozone treatment is carried out to improve the interface thermal stability of HfO2/Al2O3 gate stack on germanium (Ge) substrate. The micrometer scale level of HfO2/Al2O3 gate stack on Ge is studied using conductive atomic force microscopy (AFM) with a conductive tip. The initial results indicate that comparing with a non in-situ ozone treated sample, the interface thermal stability of the sample with an in-situ ozone treatment can be substantially improved after annealing. As a result, void-free surface, low conductive spots, low leakage current density, and relative high breakdown voltage high-κ/Ge are obtained. A detailed analysis is performed to confirm the origins of the changes. All results indicate that in-situ ozone treatment is a promising method to improve the interface properties of Ge-based three-dimensional (3D) devices in future technology nodes.
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Received: 06 March 2017
Revised: 14 April 2017
Accepted manuscript online:
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PACS:
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77.55.D-
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82.80.Pv
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(Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.))
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61604016), China Postdoctoral Science Foundation (Grant No. 2017M613028), and the Fundamental Research Funds for the Central Universities, China (Grant Nos. 310831161003 and CHD2017ZD142). |
Corresponding Authors:
Ji-Bin Fan
E-mail: jan@chd.edu.cn
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| About author: 0.1088/1674-1056/26/8/ |
Cite this article:
Ji-Bin Fan(樊继斌), Xiao-Jiao Cheng(程晓姣), Hong-Xia Liu(刘红侠), Shu-Long Wang(王树龙), Li Duan(段理) Improvement of the high-κ/Ge interface thermal stability using an in-situ ozone treatment characterized by conductive atomic force microscopy 2017 Chin. Phys. B 26 087701
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