Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method
He Zhi-Wei(何志巍)a)†, Xu Da-Yin(徐大印)b), Jiang Xiang-Hua(江祥华)c), and Wang Yin-Yue(王印月)c)
a College of Science, China Agricultural University, Beijing 100083, China; bSchool of Opto-Electronic Information, Yantai University, Yantai 264700, China; cDepartment of Physics, Lanzhou University, Lanzhou 730000, China
Abstract This paper reports that by using the hydrofluoric acid (HF) as the acid catalyst, F doped nanoporous low-k SiO$_{2}$ thin films have been prepared by means of sol-gel method. The characterization of atomic force microscopy and Fourier transform infrared spectroscopy demonstrates that the HF catalyzed films are more hydrophobic. The N$_{2}$ adsorption/desorption experiments show that the suited introduction of HF increases the porosity and decreases the pore size distribution (about 10\,nm) in the films. The above results indicate that the hydrofluoric acid is the more suitable acid catalyst than the hydrochloric one for preparing nanoporous ultra low-k SiO$_{2}$ thin films.
Received: 22 July 2007
Revised: 09 December 2007
Accepted manuscript online:
He Zhi-Wei(何志巍), Xu Da-Yin(徐大印), Jiang Xiang-Hua(江祥华), and Wang Yin-Yue(王印月) Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method 2008 Chin. Phys. B 17 3021
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
