Surface properties of diamond-like carbon films prepared by CVD and PVD methods
Liu Dong-Ping (刘东平)a, Liu Yan-Hong (刘艳红)b, Chen Bao-Xiang (陈宝祥)a
a Department of Mathematics and Physics, Dalian Nationality University, Dalian 116600, China; b State Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
Abstract Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance---plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered---pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp$^{3}$ hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp$^{3}$ hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.
Received: 12 August 2005
Revised: 12 October 2005
Accepted manuscript online:
PACS:
68.55.Ln
(Defects and impurities: doping, implantation, distribution, concentration, etc.)
Fund: Project supported by National Natural Science Foundation of China (Grant No 10405005).
Cite this article:
Liu Dong-Ping (刘东平), Liu Yan-Hong (刘艳红), Chen Bao-Xiang (陈宝祥) Surface properties of diamond-like carbon films prepared by CVD and PVD methods 2006 Chinese Physics 15 575
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