Magnesium incorporation efficiencies in MgxZn1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition

doi:10.1088/1674-1056/26/6/068104

Abstract We investigate the magnesium (Mg) incorporation efficiencies in Mg_xZn_1-xO films on c-plane Zn-face ZnO substrates by using metalorganic chemical vapor deposition (MOCVD) technique. In order to deposit high quality Mg_xZn_1-xO films, atomically smooth epi-ready surfaces of the hydrothermal grown ZnO substrates are achieved by thermal annealing in O₂ atmosphere and characterized by atomic force microscope (AFM). The AFM, scanning electron microscope (SEM), and x-ray diffraction (XRD) studies demonstrate that the Mg_xZn_1-xO films each have flat surface and hexagonal wurtzite structure without phase segregation at up to Mg content of 34.4%. The effects of the growth parameters including substrate temperature, reactor pressure and VI/II ratio on Mg content in the films are investigated by XRD analysis based on Vegard's law, and confirmed by photo-luminescence spectra and x-ray photoelectron spectroscopy as well. It is indicated that high substrate temperature, low reactor pressure, and high VI/II ratio are good for obtaining high Mg content.

Keywords: Mg_xZn_1-xO MOCVD incorporation efficiency ZnO bulk crystal

Received: 31 October 2016
Revised: 04 March 2017
Accepted manuscript online:

PACS:	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
	68.37.-d	(Microscopy of surfaces, interfaces, and thin films)
	71.55.Gs	(II-VI semiconductors)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61474121) and the Major Scientific Project of Fujian Province, China (Grant No. 2014NZ0002-2).

Corresponding Authors: Kai Ding
E-mail: kding@fjirsm.ac.cn

Cite this article:

Qi-Chang Hu(胡启昌), Kai Ding(丁凯) Magnesium incorporation efficiencies in Mg_xZn_1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition 2017 Chin. Phys. B 26 068104

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Magnesium incorporation efficiencies in MgxZn1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition

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Magnesium incorporation efficiencies in Mg_xZn_1-xO films on ZnO substrates grown by metalorganic chemical vapor deposition