Relationship between bias voltage and microstructureas well as properties of CrAlYN films

doi:10.1088/1674-1056/24/11/116201

Abstract In this work, a series of CrAlYN films doped with 1 at.% yttrium were deposited by unbalanced reactive magnetron sputtering under different bias voltages. The effects of bias voltage on microstructure and properties of the CrAlYN films were subsequently investigated. It is found that all the as-deposited films have similar chemical composition and crystalline structure. However, the bias voltage has significant impact on the mechanical properties and oxidation resistance of the resulting films. Namely, the film deposited at 100 V has the highest hardness and best oxidation resistance, which are mainly attributed to its denser structure and higher Al content than others. In addition, the film obtained at 100 V exhibits superior oxidation resistance even at 1000 ℃, and good friction and wear properties at 600 and 800 ℃, and the latter two are mainly ascribed to the formation of compact transfer layer on the worn surfaces. However, this film experienced obvious wear loss at low testing temperatures (i.e., 200 and 400 ℃) due to the serious abrasive wear.

Keywords: CrAlYN film bias voltage microstructure properties

Received: 11 January 2015
Revised: 24 July 2015
Accepted manuscript online:

PACS:	62.20.Qp	(Friction, tribology, and hardness)
	68.55.-a	(Thin film structure and morphology)
	68.60.Dv	(Thermal stability; thermal effects)

Fund: Project supported by the National Basic Research Program of China (Grant No. 2013CB632302) and the National Natural Science Foundation of China (Grant No. 51175491).

Corresponding Authors: Ji Li, Chen Jian-Min
E-mail: jili@licp.cas.cn;Chenjm@licp.cas.cn

Cite this article:

Fu Ying-Ying (付英英), Li Hong-Xuan (李红轩), Ji Li (吉利), Liu Xiao-Hong (刘晓红), Liu Liu (刘流), Zhou Hui-Di (周惠娣), Chen Jian-Min (陈建敏) Relationship between bias voltage and microstructureas well as properties of CrAlYN films 2015 Chin. Phys. B 24 116201

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Relationship between bias voltage and microstructureas well as properties of CrAlYN films

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