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Chin. Phys. B, 2014, Vol. 23(8): 087504    DOI: 10.1088/1674-1056/23/8/087504
SPECIAL TOPI—International Conference on Nanoscience & Technology, China 2013 Prev   Next  

Influence of magnetic layer thickness on [Fe80Ni20–O/SiO2]n multilayer thin films

Wei Jian-Qing (魏建清), Geng Hao (耿昊), Xu Lei (徐磊), Wang Lai-Sen (王来森), Chen Yuan-Zhi (陈远志), Yue Guang-Hui (岳光辉), Peng Dong-Liang (彭栋梁)
Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen 361005, China
Abstract  In the present work, a series of [Fe80Ni20-O/SiO2]n multilayer thin films is fabricated using a reactive magnetron sputtering equipment. The thickness of SiO2 interlayer is fixed at 3 nm, while the thickness values of Fe80Ni20-O magnetic films range from 10 nm to 30 nm. All films present obvious in-plane uniaxial magnetic anisotropy. With increasing the Fe80Ni20-O layer thickness, the saturation magnetization increases slightly and the coercivity becomes larger due to the enlarged grain size, which could weaken the soft magnetic property. The results of high frequency magnetic permeability characterization show that films with thin magnetic layer are more suitable for practical applications. When the thickness of Fe80Ni20-O layer is 10 nm, the multilayer film exhibits the most comprehensive high-frequency magnetic property with a real permeability of 300 in gigahertz range.
Keywords:  magnetron sputtering      multilayer films      soft magnetic property      high frequency permeability  
Received:  04 September 2013      Revised:  26 March 2014      Accepted manuscript online: 
PACS:  75.75.-c (Magnetic properties of nanostructures)  
  75.70.Cn (Magnetic properties of interfaces (multilayers, superlattices, heterostructures))  
  75.30.Gw (Magnetic anisotropy)  
  75.50.Gg (Ferrimagnetics)  
Fund: Project supported by the National Basic Research Program of China (Grant No. 2012CB933103), the National Natural Science Foundation of China (Grant Nos. 51371154, 51301145, 51171158, and 50825101), and the Fundamental Research Funds for the Central Universities of China (Grant No. 201212G001).
Corresponding Authors:  Wang Lai-Sen, Peng Dong-Liang     E-mail:  wangls@xmu.edu.cn;dlpeng@xmu.edu.cn

Cite this article: 

Wei Jian-Qing (魏建清), Geng Hao (耿昊), Xu Lei (徐磊), Wang Lai-Sen (王来森), Chen Yuan-Zhi (陈远志), Yue Guang-Hui (岳光辉), Peng Dong-Liang (彭栋梁) Influence of magnetic layer thickness on [Fe80Ni20–O/SiO2]n multilayer thin films 2014 Chin. Phys. B 23 087504

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