Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

doi:10.1088/1674-1056/19/7/075206

Abstract The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33×10³—1.01×10⁵ Pa)) as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.

Keywords: hairpin resonator probe simulation high-pressure plasma transmission line model

Received: 19 August 2009
Accepted manuscript online:

PACS:	52.70.Gw	(Radio-frequency and microwave measurements)
	52.70.Ds	(Electric and magnetic measurements)
	52.40.Kh	(Plasma sheaths)
	52.25.Mq	(Dielectric properties)
	52.65.-y	(Plasma simulation)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 10835004 ), and the 2nd Knowledge Cluster Research Project of Japan: Tokai Region Nanotechnology Manufacturing Cluster (Innovation of Environment Friendly Highly Functional Materials and Devices).

Cite this article:

Xu Jin-Zhou (徐金洲), Shi Jian-Jun (石建军), Zhang Jing (张菁), Zhang Qi (张琪), Nakamura Keji (中村圭二), Sugai Hideo (菅井秀郎) Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath 2010 Chin. Phys. B 19 075206

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Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

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