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Chin. Phys., 2005, Vol. 14(1): 154-158    DOI: 10.1088/1009-1963/14/1/028
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Guo Weia, Wang Longa, Shao Fu-Qiub, Ouyang Jian-Mingc
a Institute of Physics, Chinese Academy of Sciences, Beijing,100080, China; b National University of Defence Science and Technology,Changsha,410073, China; c National University of Defence Science and Technology,Changsha,410073, China;Institute of Physics, Chinese Academy of Sciences, Beijing,100080, China
Abstract  A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.
Keywords:  helium plasma      chemical processes      lifetime     
Received:  04 June 2004      Published:  20 January 2005
PACS:  5220  
  9410F  
  7220J  

Cite this article: 

Ouyang Jian-Ming, Guo Wei, Wang Long, Shao Fu-Qiu Numerical simulation of chemical processes in helium plasmas in atmosphere environment 2005 Chin. Phys. 14 154

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