Ultraviolet emission of ZnO film prepared by electrophoretic deposition
Wang Zhi-Jun (王志军)ab, Wang Zhi-Jian (王之建)a, Li Shou-Chun (李守春)b, Wang Ze-Heng (王泽恒)b, Lü You-Ming (吕有明)a, Yuan Jin-Shan (元金山)a
a Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China; b College of Physics, Jilin University, Changchun 130026, China
Abstract We deposited high quality ZnO film by electrophoretic deposition (EPD) using high quality ZnO powder prepared by solid-state pyrolytic reaction. X-ray photoelectron spectroscopy (XPS) and the infrared (IR) absorption spectrum clearly indicate that the ZnO phase powder has been prepared. Transmission electron microscope (TEM) imaging and x-ray diffraction (XRD) show that the average grain size of the powder is about 20nm. XRD and selected-area electron diffraction (SAED) reveal that the ZnO film has a polycrystalline hexagonal wurtzite structure. Only a strong ultraviolet emission peak at 390nm can be observed at room temperature.
Received: 30 June 2003
Revised: 19 November 2003
Accepted manuscript online:
Fund: Project supported by the ‘863' High Technology Research Programme of China (Grant No 2001AA31112) ,the National Natural Science Foundation of China (Grant No 60278031) and the Innovation Project of Chinese Academy of Sciences.
Cite this article:
Wang Zhi-Jun (王志军), Wang Zhi-Jian (王之建), Li Shou-Chun (李守春), Wang Ze-Heng (王泽恒), Lü You-Ming (吕有明), Yuan Jin-Shan (元金山) Ultraviolet emission of ZnO film prepared by electrophoretic deposition 2004 Chinese Physics 13 750
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