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Chin. Phys. B, 2021, Vol. 30(8): 087102    DOI: 10.1088/1674-1056/ac04a5
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

High-frequency enhancement-mode millimeterwave AlGaN/GaN HEMT with an fT/fmax over 100 GHz/200 GHz

Sheng Wu(武盛), Minhan Mi(宓珉瀚), Xiaohua Ma(马晓华), Ling Yang(杨凌), Bin Hou(侯斌), and Yue Hao(郝跃)
Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
Abstract  Ultra-thin barrier (UTB) 4-nm-AlGaN/GaN normally-off high electron mobility transistors (HEMTs) having a high current gain cut-off frequency (fT) are demonstrated by the stress-engineered compressive SiN trench technology. The compressive in-situ SiN guarantees the UTB-AlGaN/GaN heterostructure can operate a high electron density of 1.27×1013cm-2, a high uniform sheet resistance of 312.8 Ω /□, but a negative threshold for the short-gate devices fabricated on it. With the lateral stress-engineering by full removing in-situ SiN in the 600-nm SiN trench, the short-gated (70 nm) devices obtain a threshold of 0.2 V, achieving the devices operating at enhancement-mode (E-mode). Meanwhile, the novel device also can operate a large current of 610 mA/mm and a high transconductance of 394 mS/mm for the E-mode devices. Most of all, a high fT/fmax of 128 GHz/255 GHz is obtained, which is the highest value among the reported E-mode AlGaN/GaN HEMTs. Besides, being together with the 211 GHz/346 GHz of fT/fmax for the D-mode HEMTs fabricated on the same materials, this design of E/D-mode with the realization of fmax over 200 GHz in this work is the first one that can be used in Q-band mixed-signal application with further optimization. And the minimized processing difference between the E- and D-mode designs the addition of the SiN trench, will promise an enormous competitive advantage in the fabricating costs.
Keywords:  ultra-thin barrier (UTB)      AlGaN/GaN      in-situ SiN      stress-engineering      enhancement-mode      mixed-signal applications  
Received:  06 April 2021      Revised:  01 May 2021      Accepted manuscript online:  25 May 2021
PACS:  71.55.Eq (III-V semiconductors)  
  73.20.-r (Electron states at surfaces and interfaces)  
  73.50.-h (Electronic transport phenomena in thin films)  
Fund: Project supported by the National Key Research and Development Program of China (Grant No. 2020YFB1804902), the National Natural Science Foundation of China (Grant No. 61904135), the China Postdoctoral Science Foundation (Grant Nos. 2018M640957 and BX20200262), and the Natural Science Foundation of Shaanxi Province, China (Grant No. 2020JQ-316).
Corresponding Authors:  Minhan Mi     E-mail:  miminhan@qq.com

Cite this article: 

Sheng Wu(武盛), Minhan Mi(宓珉瀚), Xiaohua Ma(马晓华), Ling Yang(杨凌), Bin Hou(侯斌), and Yue Hao(郝跃) High-frequency enhancement-mode millimeterwave AlGaN/GaN HEMT with an fT/fmax over 100 GHz/200 GHz 2021 Chin. Phys. B 30 087102

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