Surface termination effects on the electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition

doi:10.1088/1674-1056/abc0d4

Abstract

Effects of initial surface termination on electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition are studied by conductive atomic force microscopy working in contact mode and standard electrical characterization methods. It is found that, compared with La₂O₃/Al₂O₃ nanolaminates with LaO_x as termination, lower interface trap density, less current leakage spots, and higher breakdown voltage are obtained in the La₂O₃/Al₂O₃ nanolaminates with AlO_x as termination after annealing. A clear promotion of interface silicate layer is observed for La₂O₃/Al₂O₃ nanolaminates with AlO_x as termination compared with LaO_x as termination under the same annealing condition. In addition, the current conduction mechanism in La₂O₃/Al₂O₃ nanolaminates is considered as the Poole–Frenkel conduction. All results indicate that the AlO_x is a more appropriate termination to deposit La₂O₃/Al₂O₃ nanolaminates on Si substrate, which is useful for the high-κ process development.

Keywords: La₂O₃/Al₂O₃ atomic layer deposition termination annealing

Received: 14 May 2020
Revised: 24 September 2020
Accepted manuscript online: 14 October 2020

Fund: the National Natural Science Foundation of China (Grant Nos. 61604016 and 51802025), China Postdoctoral Science Foundation (Grant No. 2017M613028), the Fundamental Research Funds for the Central Universities, China (Grant Nos. 300102319209 and 300102310501) and the Innovation, and Entrepreneurship Training Program for Undergraduates (Grant Nos. 202010710231 and 201910710564).

Corresponding Authors: ^†Corresponding author. E-mail: jbfan@chd.edu.cn

Cite this article:

Ji-Bin Fan(樊继斌), Shan-Ya Ling(凌山雅), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Ting-Ting Guo(郭婷婷), Xing Wei(魏星), and Qing He(何清)$ Surface termination effects on the electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition 2020 Chin. Phys. B 29 117701

Fig. 1.

Structures of the La₂O₃/Al₂O₃ nanolaminates with (a) AlO_x termination, and (b) LaO_x termination.

Fig. 2.

The C–V characteristics of La₂O₃/Al₂O₃ nanolaminates with different terminations (f = 100 kHz).

Fig. 3.

Interface state density of La₂O₃/Al₂O₃ nanolaminates with different terminations.

Fig. 4.

The CAFM images of (a) as-deposited nanolaminate-AlO_x, (b) annealed nanolaminate-AlO_x, (c) as-deposited nanolaminate-LaO_x, and (d) annealed nanolaminate-LaO_x measured by conductive AFM with a conductive tip.

Fig. 5.

The I–V curves of the La₂O₃/Al₂O₃ nanolaminates measured at the positions of conductive spots in the CAFM images.

Fig. 6.

The plot of ln(J/E) versus E^1/2 obtained from the I–V curves of Fig. 5.

Fig. 7.

The O_1s spectra of La₂O₃/Al₂O₃ nanolaminates with different terminations deposited by the ALD.

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Surface termination effects on the electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition

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Surface termination effects on the electrical characteristics of La₂O₃/Al₂O₃ nanolaminates deposited by atomic layer deposition