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Chin. Phys. B, 2020, Vol. 29(11): 117301    DOI: 10.1088/1674-1056/aba2e0
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Short-wavelength infrared InAs/GaSb superlattice hole avalanche photodiode

Jia-Feng Liu(刘家丰)1,2, †, Ning-Tao Zhang(张宁涛)4, †, Yan Teng(滕)1,2, Xiu-Jun Hao(郝修军)2,3, Yu Zhao(赵宇)2, Ying Chen(陈影)1,2, He Zhu(朱赫)1,2, Hong Zhu(朱虹)1,2, Qi-Hua Wu(吴启花)2, Xin Li(李欣)2, Bai-Le Chen(陈佰乐)4,§, and Yong Huang(黄勇)1,2,, ‡
1 School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
2 Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
3 School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
4 School of Information Science and Technology, ShanghaiTech University, Shanghai 201210, China
Abstract  

We demonstrate two short-wavelength infrared avalanche photodiodes based on InAs/GaSb superlattice grown by metal-organic chemical vapor deposition. The difference between the two devices, namely, p+nn+ and p+nnn+, is that the p+nnn+ device possesses an additional middle-doped layer to separate the multiplication region from the absorption region. By properly controlling the electric field distribution in the p+nnn+ device, an electric field of 906 kV/cm has been achieved, which is 2.6 times higher than that in the p+nn+ device. At a reverse bias of –0.1 V at 77 K, both devices show a 100% cut-off wavelength of 2.25 μm. The p+nn+ and p+nnn+ show a dark current density of 1.5 × 10−7 A/cm2 and 1.8 × 10−8 A/cm2, and a peak responsivity about 0.35 A/W and 0.40 A/W at 1.5 μm, respectively. A maximum multiplication gain of 55 is achieved in the p+nnn+ device while the value is only less than 2 in the p+nn+ device. Exponential nature of the gain characteristic as a function of reverse bias confirms a single carrier hole dominated impact ionization.

Keywords:  short-wavelength infrared      InAs/GaSb superlattice      avalanche photodiodes      metal-organic chemical vapor deposition  
Received:  13 May 2020      Revised:  19 June 2020      Published:  03 November 2020
Fund: the National Natural Science Foundation of China (Grant Nos. 61874179, 61804161, and 61975121) and the National Key Research and Development Program of China (Grant No. 2019YFB2203400).
Corresponding Authors:  These authors contributed equally to this work. Corresponding author. E-mail: yhuang2014@sinano.ac.cn §Corresponding author. E-mail: chenbl@shanghaitech.edu.cn   

Cite this article: 

Jia-Feng Liu(刘家丰), Ning-Tao Zhang(张宁涛), Yan Teng(滕), Xiu-Jun Hao(郝修军), Yu Zhao(赵宇), Ying Chen(陈影), He Zhu(朱赫), Hong Zhu(朱虹), Qi-Hua Wu(吴启花), Xin Li(李欣), Bai-Le Chen(陈佰乐)§, and Yong Huang(黄勇) Short-wavelength infrared InAs/GaSb superlattice hole avalanche photodiode 2020 Chin. Phys. B 29 117301

Fig. 1.  

The schematic cross-section of (a) p+nn+ device and (b) p+nnn+ device. (c) Simulation of electric field distribution and intensity of corresponding two devices.

Fig. 2.  

The dark current density as a function of applied bias for the p+nn+ and p+nnn+ devices measured under 77 K.

Fig. 3.  

The comparison of (a) spectral responsivity and (b) quantum efficiency for p+nn+ and p+nnn+ devices.

Fig. 4.  

Total current with illumination, dark current, and corresponding multiplication gain vs. applied reverse bias for the (a) p+nn+ device, and (b) p+nnn+ device at 77 K.

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