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Chin. Phys. B, 2020, Vol. 29(4): 046202    DOI: 10.1088/1674-1056/ab7802
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Improvement of high-frequency properties of Co2FeSi Heusler films by ultrathin Ru underlayer

Cuiling Wang(王翠玲)1,2, Shouheng Zhang(张守珩)1, Shandong Li(李山东)1, Honglei Du(杜洪磊)1,3, Guoxia Zhao(赵国霞)1, Derang Cao(曹德让)1
1 College of Physics, Center for Marine Observation and Communication, Qingdao University, Qingdao 266071, China;
2 College of Electronic and Information Engineering, Shandong University of Science and Technology, Qingdao 266510, China;
3 School of Physics, Shandong University, Jinan 250100, China
Abstract  Heusler Co2FeSi films with a uniaxial magnetic anisotropy and high ferromagnetic resonance frequency fr were deposited by an oblique sputtering technique on Ru underlayers with various thicknesses tRu from 0 nm to 5 nm. It is revealed that the Ru underlayers reduce the grain size of Co2FeSi, dramatically enhance the magnetic anisotropy field HK induced by the internal stress from 242 Oe (1 Oe=79.5775 A·m-1) to 582 Oe with an increment ratio of 2.4, while a low damping coefficient remains. The result of damping implies that the continuous interface between Ru and Co2FeSi induces a large in-plane anisotropic field without introducing additional external damping. As a result, excellent high-frequency soft magnetic properties with fr up to 6.69 GHz are achieved.
Keywords:  oblique sputtering      ferromagnetic resonance      Ru underlayer      Heusler thin film  
Received:  16 December 2019      Revised:  17 February 2020      Published:  05 April 2020
PACS:  62.25.Fg (High-frequency properties, responses to resonant or transient (time-dependent) fields)  
  75.70.-i (Magnetic properties of thin films, surfaces, and interfaces)  
  75.30.Gw (Magnetic anisotropy)  
  71.55.Ak (Metals, semimetals, and alloys)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11674187 and 51871127) and the Fund from the Technology on Electronic Test & Measurement Laboratory (Grant No. 6142001180103).
Corresponding Authors:  Shandong Li     E-mail:  lishd@qdu.edu.cn

Cite this article: 

Cuiling Wang(王翠玲), Shouheng Zhang(张守珩), Shandong Li(李山东), Honglei Du(杜洪磊), Guoxia Zhao(赵国霞), Derang Cao(曹德让) Improvement of high-frequency properties of Co2FeSi Heusler films by ultrathin Ru underlayer 2020 Chin. Phys. B 29 046202

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