| ELECTROMAGNETISM, OPTICS, ACOUSTICS, HEAT TRANSFER, CLASSICAL MECHANICS, AND FLUID DYNAMICS |
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Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray |
| Mei-Hua Fang(方美华)1, Peng-Yu Tian(田鹏宇)1, Mao-Dong Zhu(朱茂东)2, Hong-Ji Qi(齐红基)2, Tao Fei(费涛)1, Jin-Peng Lv(吕金鹏)1, Hui-Ping Liu(刘会平)3 |
1 College of Astronautics, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China;
2 Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Machanics, Chinese Academy of Sciences, Shanghai 201800, China;
3 Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China |
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Abstract Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then β-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm2 to 12 J/cm2, i.e., 50% increase, after the film has been irradiated by 2.2×1013/cm2 β-ray, the particle irradiation can be used as a controllable and desirable post-processing method to improve the resistance to laser induced damage.
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Received: 03 September 2018
Revised: 27 September 2018
Accepted manuscript online:
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PACS:
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42.79.Wc
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(Optical coatings)
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46.70.Hg
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(Membranes, rods, and strings)
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79.20.Eb
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(Laser ablation)
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42.70.-a
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(Optical materials)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11405085) and the Jiangsu Provincial Natural Science Fund, China (Grant No. BK20130789). |
Corresponding Authors:
Mei-Hua Fang
E-mail: fmh_medphys@nuaa.edu.cn
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Cite this article:
Mei-Hua Fang(方美华), Peng-Yu Tian(田鹏宇), Mao-Dong Zhu(朱茂东), Hong-Ji Qi(齐红基), Tao Fei(费涛), Jin-Peng Lv(吕金鹏), Hui-Ping Liu(刘会平) Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray 2019 Chin. Phys. B 28 024215
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