Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas

doi:10.1088/1674-1056/25/10/106801

Abstract

The excellent physical and chemical properties of cubic boron nitride (c-BN) film make it a promising candidate for various industry applications. However, the c-BN film thickness restricts its practical applications in many cases. Thus, it is indispensable to develop an economic, simple and environment-friend way to synthesize high-quality thick, stable c-BN films. High-cubic-content BN films are prepared on silicon (100) substrates by radio frequency (RF) magnetron sputtering from an h-BN target at low substrate temperature. Adhesions of the c-BN films are greatly improved by adding hydrogen to the argon/nitrogen gas mixture, allowing the deposition of a film up to 5-μm thick. The compositions and the microstructure morphologies of the c-BN films grown at different substrate temperatures are systematically investigated with respect to the ratio of H₂ gas content to total working gas. In addition, a primary mechanism for the deposition of thick c-BN film is proposed.

Keywords: cubic boron nitride hydrogen plasmas RF magnetron sputtering growth diagram

Received: 16 March 2016
Revised: 23 May 2016
Accepted manuscript online:

PACS:	68.55.A-	(Nucleation and growth)
	81.15.Cd	(Deposition by sputtering)
	68.35.B-	(Structure of clean surfaces (and surface reconstruction))

Fund:

Project supported by the National Natural Science Foundation of China (Grant Nos. 51572105, 61504046, and 51272224), the Scientific Research Foundation for the Returned Overseas Chinese Scholars, State Education Ministry, China, the Development and Reform Commission of Jilin Province, China (Grant No. 2015Y050), and the Scientific Research Foundation for the Returned Overseas of Jilin Province, China.

Corresponding Authors: Hong Yin
E-mail: hyin@jlu.edu.cn

Cite this article:

Yan Zhao(赵艳), Wei Gao(高伟), Bo Xu(徐博), Ying-Ai Li(李英爱), Hong-Dong Li(李红东), Guang-Rui Gu(顾广瑞), Hong Yin(殷红) Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas 2016 Chin. Phys. B 25 106801

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Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas

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