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Chin. Phys. B, 2014, Vol. 23(4): 047804    DOI: 10.1088/1674-1056/23/4/047804

Improvement in a-plane GaN crystalline quality using wet etching method

Cao Rong-Tao, Xu Sheng-Rui, Zhang Jin-Cheng, Zhao Yi, Xue Jun-Shuai, Ha Wei, Zhang Shuai, Cui Pei-Shui, Wen Hui-Juan, Chen Xing
Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China
Abstract  Nonpolar (112 0) GaN films are grown on the etched a-plane GaN substrates via metalorganic vapor phase epitaxy. High-resolution X-ray diffraction analysis shows great decreases in the full width at half maximum of the samples grown on etched substrates compared with those of the sample without etching, both on-axis and off-axis, indicating the reduced dislocation densities and improved crystalline quality of these samples. The spatial mapping of the E2 (high) phonon mode demonstrates the smaller line width with a black background in the wing region, which testifies the reduced dislocation densities and enhanced crystalline quality of the epitaxial lateral overgrowth areas. Raman scattering spectra of the E2 (high) peaks exhibit in-plane compressive stress for all the overgrowth samples, and the E2 (high) peaks of samples grown on etched substrates shift toward the lower frequency range, indicating the relaxations of in-plane stress in these GaN films. Furthermore, room temperature photoluminescence measurement demonstrates a significant decrease in the yellow-band emission intensity of a-plane GaN grown on etched templates, which also illustrates the better optical properties of these samples.
Keywords:  nonpolar GaN      wet etching      metal-organic chemical vapor deposition      crystalline quality  
Received:  04 May 2013      Revised:  22 August 2013      Published:  15 April 2014
PACS:  78.55.Cr (III-V semiconductors)  
  81.15.Kk (Vapor phase epitaxy; growth from vapor phase)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61204006), the Fundamental Research Funds for the Central Universities, China (Grant No. K50511250002), and the National Key Science & Technology SpecialProject, China (Grant No. 2008ZX01002-002).
Corresponding Authors:  Zhang Jin-Cheng     E-mail:
About author:  78.55.Cr; 81.15.Kk

Cite this article: 

Cao Rong-Tao, Xu Sheng-Rui, Zhang Jin-Cheng, Zhao Yi, Xue Jun-Shuai, Ha Wei, Zhang Shuai, Cui Pei-Shui, Wen Hui-Juan, Chen Xing Improvement in a-plane GaN crystalline quality using wet etching method 2014 Chin. Phys. B 23 047804

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