Abstract The microwave absorption dielectric spectrum can be used to study the decay process of free photoelectrons and shallow-trapped electrons in semiconductor crystals. The decay curve of free photoelectrons and shallow-trapped electrons of silver halide grains is measured using this technique. The influence of iodide and K$_4$Fe(CN)$_6$ shallow electron trap dopants on the photoelectron lifetime of silver halide grains is studied. For the unsensitized cubic AgCl crystals, when the free photoelectron lifetime (FLT) reaches a maximum, the photographic efficiency is optimal. From our analysis, we conclude that FLT is the longest for the cubic AgCl crystals doped with 0.5% iodide at 80% doping position and $1\times10^{-6}$ mol K$_4$Fe(CN)$_6$/molAg, whereas, for the highly photosensitized cubic AgBrCl crystals doped with K$_4$Fe(CN)$_6$, the photographic efficiency is optimal when the FLT reaches its minimum. The free photoelectron lifetime reaches minimum and the sensitivity of AgBrCl emulsion reaches maximum when the doping position is 30%Ag at K$_4$Fe(CN)$_6$ content of $10^{-6}$mol/molAg.
Received: 23 January 2003
Revised: 18 August 2003
Accepted manuscript online:
Fund: Project Supported by the Key Science and Technology Research Program of Ministry of Education of China (Grant No 01011), Natural Science Foundation of Hebei Province, China (Grant No 603138), Natural Science Doctor Foundation of Hebei Province, China (Grant No B2003119), and Science and Technology Research Program of Education Bureau of Hebei Province, China (Grant No 2002153).
Cite this article:
Yang Shao-Peng (杨少鹏), Fu Guang-Sheng (傅广生), Dong Guo-Yi (董国义), Li Xiao-Wei (李晓苇), Han Li (韩理) Investigation of the photoelectron decay of silver halide microcrystal 2003 Chinese Physics 12 1435
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