Chin. Phys. B
中国物理B  2018, Vol. 27 Issue (4): 048103    DOI: 10.1088/1674-1056/27/4/048103
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY 最新目录| 下期目录| 过刊浏览| 高级检索 |
Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films
Yu Zhang(张昱), Jun Xu(徐军), Da-Yu Zhou(周大雨), Hang-Hang Wang(王行行), Wen-Qi Lu(陆文琪), Chi-Kyu Choi
1. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics, Dalian University of Technology, Dalian 116024, China;
2. School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
3. Department of Physics, Jeju National University, Jeju 63243, Korea
Structural and electrical properties of reactive magnetron sputtered yttrium-doped HfO2 films
Yu Zhang(张昱)1, Jun Xu(徐军)1, Da-Yu Zhou(周大雨)2, Hang-Hang Wang(王行行)1, Wen-Qi Lu(陆文琪)1, Chi-Kyu Choi3
1. Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics, Dalian University of Technology, Dalian 116024, China;
2. School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;
3. Department of Physics, Jeju National University, Jeju 63243, Korea

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