Chin. Phys. B
中国物理B  2017, Vol. 26 Issue (11): 118104    DOI: 10.1088/1674-1056/26/11/118104
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY 最新目录| 下期目录| 过刊浏览| 高级检索 |
Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching
Yuan Li(李源), Hongwei Yan(严鸿维), Ke Yang(杨科), Caizhen Yao(姚彩珍), Zhiqiang Wang(王志强), Chunyan Yan(闫春燕), Xinshu Zou(邹鑫书), Xiaodong Yuan(袁晓东), Liming Yang(杨李茗), Xin Ju(巨新)
1. University of Science and Technology Beijing, Department of Physics, Beijing 100083, China;
2. China Academy of Engineering Physics, Laser Fusion Research Center, Mianyang 621900, China;
3. Fine Optical Engineering Research Center, Chengdu 610041, China
Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching
Yuan Li(李源)1,2, Hongwei Yan(严鸿维)2, Ke Yang(杨科)2, Caizhen Yao(姚彩珍)2, Zhiqiang Wang(王志强)2, Chunyan Yan(闫春燕)1, Xinshu Zou(邹鑫书)2, Xiaodong Yuan(袁晓东)2, Liming Yang(杨李茗)3, Xin Ju(巨新)1
1. University of Science and Technology Beijing, Department of Physics, Beijing 100083, China;
2. China Academy of Engineering Physics, Laser Fusion Research Center, Mianyang 621900, China;
3. Fine Optical Engineering Research Center, Chengdu 610041, China

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