Chin. Phys. B
中国物理B  2017, Vol. 26 Issue (1): 016801    DOI: 10.1088/1674-1056/26/1/016801
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES 最新目录| 下期目录| 过刊浏览| 高级检索 |
Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography
Gao-Feng Liang(梁高峰), Jiao Jiao(焦蛟), Xian-Gang Luo(罗先刚), Qing Zhao(赵青)
1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography
Gao-Feng Liang(梁高峰)1,2, Jiao Jiao(焦蛟)1, Xian-Gang Luo(罗先刚)2, Qing Zhao(赵青)1
1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China

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