Chin. Phys. B
中国物理B  2017, Vol. 26 Issue (1): 015201    DOI: 10.1088/1674-1056/26/1/015201
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES 最新目录| 下期目录| 过刊浏览| 高级检索 |
Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
Xiao-Yan Sun(孙晓艳), Yu-Ru Zhang(张钰如), Xue-Chun Li(李雪春), You-Nian Wang(王友年)
Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams(Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
Xiao-Yan Sun(孙晓艳), Yu-Ru Zhang(张钰如), Xue-Chun Li(李雪春), You-Nian Wang(王友年)
Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams(Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

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