Chin. Phys. B
中国物理B  2014, Vol. 23 Issue (11): 115202    DOI: 10.1088/1674-1056/23/11/115202
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES 最新目录| 下期目录| 过刊浏览| 高级检索 |
Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias
高飞, 张钰如, 赵书霞, 李雪春, 王友年
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China
Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias
Gao Fei, Zhang Yu-Ru, Zhao Shu-Xia, Li Xue-Chun, Wang You-Nian
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Copyright © the Chinese Physical Society
Address:Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China(100190)
Tel: 010-82649026   Fax: 010-82649027   E-Mail: cpb@aphy.iphy.ac.cn
Supported by Beijing Magtech Co. Ltd. Tel: 86-010-62662699 E-mail: support@magtech.com.cn