Chin. Phys. B
中国物理B  2012, Vol. 21 Issue (7): 078105    DOI: 10.1088/1674-1056/21/7/078105
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY 最新目录| 下期目录| 过刊浏览| 高级检索 |
Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
熊玉卿a, 李兴存b, 陈强b, 雷雯雯b, 赵桥b, 桑利军b, 刘忠伟b, 王正铎b, 杨丽珍b
a Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China;
b Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
Characteristics and properties of metal aluminum thin film prepared by electron cyclotron resonance plasma-assisted atomic layer deposition technology
Xiong Yu-Qinga, Li Xing-Cunb, Chen Qiangb, Lei Wen-Wenb, Zhao Qiaob, Sang Li-Junb, Liu Zhong-Weib, Wang Zheng-Duob, Yang Li-Zhenb
a Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China;
b Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China

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