中国物理B ›› 2017, Vol. 26 ›› Issue (1): 16801-016801.doi: 10.1088/1674-1056/26/1/016801

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇    下一篇

Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography

Gao-Feng Liang(梁高峰), Jiao Jiao(焦蛟), Xian-Gang Luo(罗先刚), Qing Zhao(赵青)   

  1. 1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
    2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
  • 收稿日期:2016-08-03 修回日期:2016-09-30 出版日期:2017-01-05 发布日期:2017-01-05
  • 通讯作者: Qing Zhao E-mail:zhaoq@uestc.edu.cn
  • 基金资助:
    Project supported by the National Basic Research Program of China (Grant No. 2013CBA01702) and the National Natural Science Foundation of China (Grant No. 11275045).

Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography

Gao-Feng Liang(梁高峰)1,2, Jiao Jiao(焦蛟)1, Xian-Gang Luo(罗先刚)2, Qing Zhao(赵青)1   

  1. 1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China;
    2. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
  • Received:2016-08-03 Revised:2016-09-30 Online:2017-01-05 Published:2017-01-05
  • Contact: Qing Zhao E-mail:zhaoq@uestc.edu.cn
  • Supported by:
    Project supported by the National Basic Research Program of China (Grant No. 2013CBA01702) and the National Natural Science Foundation of China (Grant No. 11275045).

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摘要： The silver (Ag)/photoresist (PR)/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.

关键词: surface roughness, lithography, silver film, deposition

Abstract: The silver (Ag)/photoresist (PR)/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.

Key words: surface roughness, lithography, silver film, deposition

中图分类号:  (Interface structure and roughness)

  • 68.35.Ct
81.16.Nd (Micro- and nanolithography) 68.55.-a (Thin film structure and morphology) 81.15.-z (Methods of deposition of films and coatings; film growth and epitaxy)