中国物理B ›› 2016, Vol. 25 ›› Issue (4): 48104-048104.doi: 10.1088/1674-1056/25/4/048104

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Subsurface defect characterization and laser-induced damage performance of fused silica optics polished with colloidal silica and ceria

Xiang He(何祥), Gang Wang(王刚), Heng Zhao(赵恒), Ping Ma(马平)   

  1. Chengdu Fine Optical Engineering Research Center, Chengdu 610041, China
  • 收稿日期:2015-08-07 修回日期:2015-12-12 出版日期:2016-04-05 发布日期:2016-04-05
  • 通讯作者: Ping Ma E-mail:map@263.net

Subsurface defect characterization and laser-induced damage performance of fused silica optics polished with colloidal silica and ceria

Xiang He(何祥), Gang Wang(王刚), Heng Zhao(赵恒), Ping Ma(马平)   

  1. Chengdu Fine Optical Engineering Research Center, Chengdu 610041, China
  • Received:2015-08-07 Revised:2015-12-12 Online:2016-04-05 Published:2016-04-05
  • Contact: Ping Ma E-mail:map@263.net

摘要:

This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared (RMS) average surface roughness values are 0.7 nm and 1.0 nm, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive contaminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.

关键词: polishing, laser-induced damage, fused silica, colloidal silica

Abstract:

This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fused silica optics. The colloidal silica polished samples and ceria polished samples exhibit that the root-mean-squared (RMS) average surface roughness values are 0.7 nm and 1.0 nm, respectively. The subsurface defects and damage performance of the polished optics are analyzed and discussed. It is revealed that colloidal silica polishing will introduce much fewer absorptive contaminant elements and subsurface damages especially no trailing indentation fracture. The 355-nm laser damage test reveals that each of the fused silica samples polished with colloidal silica has a much higher damage threshold and lower damage density than ceria polished samples. Colloidal silica polishing is potential in manufacturing high power laser optics.

Key words: polishing, laser-induced damage, fused silica, colloidal silica

中图分类号:  (Pulsed laser ablation deposition)

  • 81.15.Fg
61.80.Ba (Ultraviolet, visible, and infrared radiation effects (including laser radiation)) 81.65.Ps (Polishing, grinding, surface finishing) 42.70.Ce (Glasses, quartz)