中国物理B ›› 2016, Vol. 25 ›› Issue (12): 128101-128101.doi: 10.1088/1674-1056/25/12/128101

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Nanoscale spatial phase modulation of GaAs growth in V-grooved trenches on Si (001) substrate

Shi-Yan Li(李士颜), Xu-Liang Zhou(周旭亮), Xiang-Ting Kong(孔祥挺), Meng-Ke Li(李梦珂), Jun-Ping Mi(米俊萍), Meng-Qi Wang(王梦琦), Jiao-Qing Pan(潘教青)   

  1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 收稿日期:2015-12-20 修回日期:2016-08-25 出版日期:2016-12-05 发布日期:2016-12-05
  • 通讯作者: Jiao-Qing Pan E-mail:jqpan@semi.ac.cn
  • 基金资助:

    Project supported by the National Science and Technology Major Project of Science and Technology of China (Grant No. 2011ZX02708) and the National Natural Science Foundation of China (Grant No. 61504137).

Nanoscale spatial phase modulation of GaAs growth in V-grooved trenches on Si (001) substrate

Shi-Yan Li(李士颜), Xu-Liang Zhou(周旭亮), Xiang-Ting Kong(孔祥挺), Meng-Ke Li(李梦珂), Jun-Ping Mi(米俊萍), Meng-Qi Wang(王梦琦), Jiao-Qing Pan(潘教青)   

  1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • Received:2015-12-20 Revised:2016-08-25 Online:2016-12-05 Published:2016-12-05
  • Contact: Jiao-Qing Pan E-mail:jqpan@semi.ac.cn
  • Supported by:

    Project supported by the National Science and Technology Major Project of Science and Technology of China (Grant No. 2011ZX02708) and the National Natural Science Foundation of China (Grant No. 61504137).

摘要:

This letter reports the nanoscale spatial phase modulation of GaAs growth in V-grooved trenches fabricated on a Si (001) substrate by metal-organic vapor-phase epitaxy. Two hexagonal GaAs regions with high density of stacking faults parallel to Si {111} surfaces are observed. A strain-relieved and defect-free cubic phase GaAs was achieved above these highly defective regions. High-resolution transmission electron microscopy and fast Fourier transforms analysis were performed to characterize these regions of GaAs/Si interface. We also discussed the strain relaxation mechanism and phase structure modulation of GaAs selectively grown on this artificially manipulated surface.

关键词: phase modulation, GaAs, grooves, Si

Abstract:

This letter reports the nanoscale spatial phase modulation of GaAs growth in V-grooved trenches fabricated on a Si (001) substrate by metal-organic vapor-phase epitaxy. Two hexagonal GaAs regions with high density of stacking faults parallel to Si {111} surfaces are observed. A strain-relieved and defect-free cubic phase GaAs was achieved above these highly defective regions. High-resolution transmission electron microscopy and fast Fourier transforms analysis were performed to characterize these regions of GaAs/Si interface. We also discussed the strain relaxation mechanism and phase structure modulation of GaAs selectively grown on this artificially manipulated surface.

Key words: phase modulation, GaAs, grooves, Si

中图分类号:  (III-V semiconductors)

  • 81.05.Ea
81.05.Cy (Elemental semiconductors) 64.75.Qr (Phase separation and segregation in semiconductors)