›› 2014, Vol. 23 ›› Issue (9): 98105-098105.doi: 10.1088/1674-1056/23/9/098105

• INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY • 上一篇    下一篇

Structures and optical properties of tungsten oxide thin films deposited by magnetron sputtering of WO3 bulk：Effects of annealing temperatures

张锋a, 王海千b, 王松c, 汪竟阳c, 钟志成c, 金叶a   

  1. a School of Optoelectronic Information, Chongqing University of Technology, Chongqing 400054, China;
    b Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026, China;
    c Hubei Key Laboratory of Low Dimensional Optoelectronic Material and Devices, Xiangyang 441053, China
  • 收稿日期:2014-01-16 修回日期:2014-03-31 出版日期:2014-09-15 发布日期:2014-09-15
  • 基金资助:
    Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant Nos. 11104365 and 11104366) and the Hubei Key Laboratory of Low Dimensional Optoelectronic Material and Devices, China (Grant No. 13XKL02002).

Structures and optical properties of tungsten oxide thin films deposited by magnetron sputtering of WO3 bulk：Effects of annealing temperatures

Zhang Feng (张锋)a, Wang Hai-Qian (王海千)b, Wang Song (王松)c, Wang Jing-Yang (汪竟阳)c, Zhong Zhi-Cheng (钟志成)c, Jin Ye (金叶)a   

  1. a School of Optoelectronic Information, Chongqing University of Technology, Chongqing 400054, China;
    b Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026, China;
    c Hubei Key Laboratory of Low Dimensional Optoelectronic Material and Devices, Xiangyang 441053, China
  • Received:2014-01-16 Revised:2014-03-31 Online:2014-09-15 Published:2014-09-15
  • Contact: Zhang Feng E-mail:zf080707@cqut.edu.cn
  • Supported by:
    Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant Nos. 11104365 and 11104366) and the Hubei Key Laboratory of Low Dimensional Optoelectronic Material and Devices, China (Grant No. 13XKL02002).

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摘要： Tungsten oxide thin films were deposited on glass substrates by the magnetron sputtering of WO3 bulk at room temperature. The deposited films were annealed at different temperatures in air. The structural measurements indicate that the films annealed below 300℃ were amorphous, while the films annealed at 400℃ were mixed crystalline with hexagonal and triclinic phases of WO3. It was observed that the crystallization of the annealed films becomes more and more distinct with an increase in the annealing temperature. At 400℃, nanorod-like structures were observed on the film surface when the annealing time was increased from 60 min to 180 min. The presence of W=O stretching, W-O-W stretching, W-O-W bending and various lattice vibration modes were observed in Raman measurements. The optical absorption behaviors of the films in the range of 450-800 nm are very different with changing annealing temperatures from the room temperature to 400℃. After annealing at 400℃, the film becomes almost transparent. Increasing annealing time at 400℃ can lead to a small blue shift of the optical gap of the film.

关键词: tungsten oxide film, magnetron sputtering, structure, optical property

Abstract: Tungsten oxide thin films were deposited on glass substrates by the magnetron sputtering of WO3 bulk at room temperature. The deposited films were annealed at different temperatures in air. The structural measurements indicate that the films annealed below 300℃ were amorphous, while the films annealed at 400℃ were mixed crystalline with hexagonal and triclinic phases of WO3. It was observed that the crystallization of the annealed films becomes more and more distinct with an increase in the annealing temperature. At 400℃, nanorod-like structures were observed on the film surface when the annealing time was increased from 60 min to 180 min. The presence of W=O stretching, W-O-W stretching, W-O-W bending and various lattice vibration modes were observed in Raman measurements. The optical absorption behaviors of the films in the range of 450-800 nm are very different with changing annealing temperatures from the room temperature to 400℃. After annealing at 400℃, the film becomes almost transparent. Increasing annealing time at 400℃ can lead to a small blue shift of the optical gap of the film.

Key words: tungsten oxide film, magnetron sputtering, structure, optical property

中图分类号:  (Treatment of materials and its effects on microstructure, nanostructure, And properties)

  • 81.40.-z
78.20.-e (Optical properties of bulk materials and thin films) 78.66.-w (Optical properties of specific thin films)