›› 2014, Vol. 23 ›› Issue (8): 87305-087305.doi: 10.1088/1674-1056/23/8/087305

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

A two-dimensional fully analytical model with polarization effect for off-state channel potential and electric field distributions of GaN-based field-plated high electron mobility transistor

毛维a, 佘伟波a, 杨翠b, 张超a, 张进成a, 马晓华b, 张金风a, 刘红侠a, 杨林安a, 张凯a, 赵胜雷a, 陈永和a, 郑雪峰a, 郝跃a   

  1. a Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;
    b School of Physics and Optoelectronic Engineering, Xidian University, Xi'an 710071, China
  • 收稿日期:2013-10-08 修回日期:2013-11-24 出版日期:2014-08-15 发布日期:2014-08-15
  • 基金资助:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61204085 and 61334002) and the Fundamental Research Funds for the Central Universities, China (Grant No. K5051225013).

A two-dimensional fully analytical model with polarization effect for off-state channel potential and electric field distributions of GaN-based field-plated high electron mobility transistor

Mao Wei (毛维)a, She Wei-Bo (佘伟波)a, Yang Cui (杨翠)b, Zhang Chao (张超)a, Zhang Jin-Cheng (张进成)a, Ma Xiao-Hua (马晓华)b, Zhang Jin-Feng (张金风)a, Liu Hong-Xia (刘红侠)a, Yang Lin-An (杨林安)a, Zhang Kai (张凯)a, Zhao Sheng-Lei (赵胜雷)a, Chen Yong-He (陈永和)a, Zheng Xue-Feng (郑雪峰)a, Hao Yue (郝跃)a   

  1. a Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;
    b School of Physics and Optoelectronic Engineering, Xidian University, Xi'an 710071, China
  • Received:2013-10-08 Revised:2013-11-24 Online:2014-08-15 Published:2014-08-15
  • Contact: Mao Wei E-mail:mwxidian@126.com
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 61204085 and 61334002) and the Fundamental Research Funds for the Central Universities, China (Grant No. K5051225013).

摘要: In this paper, we present a two-dimensional (2D) fully analytical model with consideration of polarization effect for the channel potential and electric field distributions of the gate field-plated high electron mobility transistor (FP-HEMT) on the basis of 2D Poisson's solution. The dependences of the channel potential and electric field distributions on drain bias, polarization charge density, FP structure parameters, AlGaN/GaN material parameters, etc. are investigated. A simple and convenient approach to designing high breakdown voltage FP-HEMTs is also proposed. The validity of this model is demonstrated by comparison with the numerical simulations with Silvaco-Atlas. The method in this paper can be extended to the development of other analytical models for different device structures, such as MIS-HEMTs, multiple-FP HETMs, slant-FP HEMTs, etc.

关键词: analytical model of GaN-based field-plated HEMT, polarization effect, potential, electric field

Abstract: In this paper, we present a two-dimensional (2D) fully analytical model with consideration of polarization effect for the channel potential and electric field distributions of the gate field-plated high electron mobility transistor (FP-HEMT) on the basis of 2D Poisson's solution. The dependences of the channel potential and electric field distributions on drain bias, polarization charge density, FP structure parameters, AlGaN/GaN material parameters, etc. are investigated. A simple and convenient approach to designing high breakdown voltage FP-HEMTs is also proposed. The validity of this model is demonstrated by comparison with the numerical simulations with Silvaco-Atlas. The method in this paper can be extended to the development of other analytical models for different device structures, such as MIS-HEMTs, multiple-FP HETMs, slant-FP HEMTs, etc.

Key words: analytical model of GaN-based field-plated HEMT, polarization effect, potential, electric field

中图分类号:  (III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions)

  • 73.40.Kp
85.30.Tv (Field effect devices) 85.30.De (Semiconductor-device characterization, design, and modeling)