中国物理B ›› 2013, Vol. 22 ›› Issue (9): 96803-096803.doi: 10.1088/1674-1056/22/09/096803

所属专题: TOPICAL REVIEW — Low-dimensional nanostructures and devices

• TOPICAL REVIEW—Low-dimensional nanostructures and devices • 上一篇    下一篇

Intercalation of metals and silicon at the interface of epitaxial graphene and its substrates

黄立a b, 徐文焱a, 阙炎德a, 毛金海a, 孟蕾a, 潘理达a, 李更a, 王业亮a, 杜世萱a, 刘云圻b, 高鸿钧a   

  1. a Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China;
    b Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
  • 收稿日期:2013-07-30 出版日期:2013-07-26 发布日期:2013-07-26
  • 基金资助:
    Project supported by the National Basic Research Program of China (Grant Nos. 2013CBA01600, 2011CB932700, 2009CB929103, and 2010CB923004), the National Natural Science Foundation of China, and the Chinese Acedemy of Sciences.

Intercalation of metals and silicon at the interface of epitaxial graphene and its substrates

Huang Li (黄立)a b, Xu Wen-Yan (徐文焱)a, Que Yan-De (阙炎德)a, Mao Jin-Hai (毛金海)a, Meng Lei (孟蕾)a, Pan Li-Da (潘理达)a, Li Geng (李更)a, Wang Ye-Liang (王业亮)a, Du Shi-Xuan (杜世萱)a, Liu Yun-Qi (刘云圻)b, Gao Hong-Jun (高鸿钧)a   

  1. a Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China;
    b Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
  • Received:2013-07-30 Online:2013-07-26 Published:2013-07-26
  • Contact: Gao Hong-Jun E-mail:hjgao@iphy.ac.cn
  • Supported by:
    Project supported by the National Basic Research Program of China (Grant Nos. 2013CBA01600, 2011CB932700, 2009CB929103, and 2010CB923004), the National Natural Science Foundation of China, and the Chinese Acedemy of Sciences.

摘要: Intercalations of metals and silicon between epitaxial graphene and its substrates are reviewed. For metal intercalation, seven different metals have been successfully intercalated at the interface of graphene/Ru(0001) and form different intercalated structures. Meanwhile, graphene maintains its original high quality after the intercalation and shows features of weakened interaction with the substrate. For silicon intercalation, two systems, graphene on Ru(0001) and on Ir(111), have been investigated. In both cases, graphene preserves its high quality and regains its original superlative properties after the silicon intercalation. More importantly, we demonstrate that thicker silicon layers can be intercalated at the interface, which allows the atomic control of the distance between graphene and the metal substrates. These results show the great potential of the intercalation method as a non-damaging approach to decouple epitaxial graphene from its substrates and even form a dielectric layer for future electronic applications.

关键词: graphene, metal intercalation, silicon intercalation, scanning tunneling microscopy

Abstract: Intercalations of metals and silicon between epitaxial graphene and its substrates are reviewed. For metal intercalation, seven different metals have been successfully intercalated at the interface of graphene/Ru(0001) and form different intercalated structures. Meanwhile, graphene maintains its original high quality after the intercalation and shows features of weakened interaction with the substrate. For silicon intercalation, two systems, graphene on Ru(0001) and on Ir(111), have been investigated. In both cases, graphene preserves its high quality and regains its original superlative properties after the silicon intercalation. More importantly, we demonstrate that thicker silicon layers can be intercalated at the interface, which allows the atomic control of the distance between graphene and the metal substrates. These results show the great potential of the intercalation method as a non-damaging approach to decouple epitaxial graphene from its substrates and even form a dielectric layer for future electronic applications.

Key words: graphene, metal intercalation, silicon intercalation, scanning tunneling microscopy

中图分类号:  (Graphene films)

  • 68.65.Pq
85.30.-z (Semiconductor devices) 68.37.Ef (Scanning tunneling microscopy (including chemistry induced with STM))